American Journal of Nano Research and Applications

Volume 4, Issue 3, May 2016

  • Studies on the Influence of Growth Time on the Rutile TiO2 Nanostructures Prepared on Si Substrates with Fabricated High-Sensitivity and Fast-Response p-n Heterojunction Photodiode

    Abbas M. Selman

    Issue: Volume 4, Issue 3, May 2016
    Pages: 23-32
    Received: 23 October 2016
    Accepted: 8 November 2016
    Published: 10 January 2017
    DOI: 10.11648/j.nano.20160403.11
    Abstract: In this study, the effect of duration on the growth of rutile TiO2 nanostructures (Ns) deposited onto the p-Si (111) substrate on the structural, morphological, and optical properties of rutile TiO2 Ns has been investigated. All Si substrates were seeded with a TiO2 seed layer synthesized using a radio-frequency (RF) reactive magnetron sputtering s... Show More