| Peer-Reviewed

A Flexible Research Reactor for Atomic Layer Deposition with a Sample-Transport Chamber for in Vacuo Analytics

Received: 16 November 2014     Accepted: 19 November 2014     Published: 23 December 2014
Views:       Downloads:
Abstract

A modular reactor for thermal atomic layer deposition (ALD) was designed, which allows changes of all reactor components in order to obtain a flexible set-up for research purpose. A sample transport chamber is included for dual purpose. It allows for in vacuo transport of samples to analytical devices such as an XPS instrument. Surface activation of the samples is possible in the same chamber via an irradiation-induced approach.

Published in American Journal of Nano Research and Applications (Volume 2, Issue 6-1)

This article belongs to the Special Issue Advanced Functional Materials

DOI 10.11648/j.nano.s.2014020601.15
Page(s) 34-38
Creative Commons

This is an Open Access article, distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution and reproduction in any medium or format, provided the original work is properly cited.

Copyright

Copyright © The Author(s), 2014. Published by Science Publishing Group

Keywords

Atomic Layer Deposition, Reactor Design, in Vacuo Sample Transport, UV Irradiation

References
[1] a) T. Kääriäinen, D. Cameron, M.-L. Kääriäninen, A. Sherman, “Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications,” John Wiley & Sons, Inc. Hoboken, New Jersey, 2013; b) R. W. Johnson, A. Hultqvist, S. F. Bent “A brief review of atomic layer deposition: from fundamentals to applications,” Materials Today, vol. 17, 2014, pp. 236-246; c) M. Leskelä, M. Ritala, “Atomic Layer Deposition Chemistry: Recent Developments and Future Challenges,” Angew. Chem. Int. Ed., vol. 42, 2003, pp. 5548 – 5554; d) N. Pinna, M. Knez, “Atomic Layer Deposition of Nanostructured Materials,” Wiley VCH, Weinheim, 2011
[2] L. Prager, U. Helmstedt, H. Herrnberger, O. Kahle, F. Kita, M. Münch, A. Pender, A. Prager, J.W. Gerlach, M. Stasiak, “Photochemical approach to high-barrier films for the encapsulation of flexible laminary electronic devices,” Thin Sol. Films, vol. 570, 2014, pp. 87-95
[3] A. Singh, H. Klumbies, U. Schröder, L. Müller-Meskamp, M. Geidel, M. Knaut, C. Hoßbach, M. Albert, K. Leo and T. Mikolajick, “Barrier performance optimization of atomic layer deposited diffusion barriers for organic light emitting diodes using x-ray reflectivity investigations,” Appl. Phys. Lett, vol. , 2013, 233302,
[4] a) E. Langereis, M. Creatore, S.B.S. Heil, M.C.M. Van de Sanden,W.M.M. Kessels, „Plasmaassisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers,” Appl. Phys. Lett, vol. 89, 2006, 081915; b) T. Kääriäinen, D. Cameron, M.-L. Kääriäinen, A. Sherman, Atomic Layer Deposition — Principles, Characteristics, and Nanotechnology Applications,” John Wiley & Sons, and Scrivener Publishing, Hoboken (NJ) and Salem (Ma), 2013
[5] J. W. Elam, M. D. Groner, and S. M. George, “Viscous Flow Reactor with Quartz Crystal Microbalance for Thin Film Growth by Atomic Layer Deposition,” Rev. Sci. Instr., vol. 73, 2002, pp. 2981-2987.
[6] M. Geidel, M. Junige, M. Albert, J. W. Bartha, „In-situ Analysis on the initial Growth of ultra-thin Ruthenium Films with Atomic Layer Deposition,” Mircoelectr. Engin., vol. 107, 2013, pp. 151-155.
[7] a) W. A. Kimes, E. F. Moore, J. E. Maslar, “Perpendicular-Flow, single-Wafer Atomic Layer Deposition Reactor Chamber Design for Use with in situ Diagnostics,” Rev. Sci. Instr., vol. 83, 2012, pp. 083106; b) J. Dendooven, K. Devloo-Casier, E. Levrau, R. Van Hove, S. P. Sree, M. R. Baklanov, J. A. Martens, C. Detavernier, “In Situ Monitoring of Atomic Layer Deposition in Nanoporous Thin Films Using Ellipsometric Porosimetry,” Langmuir, vol. 28, 2012, pp. 3852 - 3859
[8] M. Ritala, M. Juppo, K. Kukli, A. Rahtu, M. Leskela, “In situ characterization of atomic layer deposition processes by a mass spectrometer,” J. Physique IV, vol. 9, 1999, pp. 1021 – 1028.
[9] R. Methaapanon, S. M. Geyer, C. Hagglund, P. A. Pianetta, and S. F. Bent, “Portable Atomic Layer Deposition Reactor for in situ Synchrotron Photoemission Studies,” Rev. Sci. Instr., vol. 84, 2013, pp. 015104.
[10] a) A.-A. D. Jones, A. D. Jones, “Numerical Simulation and Verification of Gas Transport during an Atomic Layer Deposition Process,” Mater. Sci. Semicond. Proc., vol. 21, 2014, pp. 82-90; b) D. Q. Pan, T. Li, T.C. Jen, C. Yuan, “Numerical Modelling of Carrier Gas Flow in Atomic Layer Deposition Vacuum Reactor: A comparative Study of Latice Boltzmann Models,” J. Vac. Sci. Tech. A, vol. 32, 2013, pp. 01A110; c) A.M. Lankhorst, B.D. Paarhuis, H.J.C.M. Terhorst, P.J.P.M. Simons, C.R. Klein, “Transient ALD Simulations for a multi-Wafer Reactor with trenched Wafers,” Surf. Coat. Tech., vol. 201, 2007, pp. 22-23.
[11] To verify the reactor Al2O3 films were deposited with the instrument described above. AlMe3 (pur. ≥ 98 %) was used as obtained from Strem Chemicals Inc., Millipore ® grade water was degassed before filling of the precursor containers. Containers were kept at room temperature during deposition. Nitrogen was used as a carrier gas at a flow rate of 600 ml/min. Pulsing times were 1 s for the precursors and 4 s for purge gas. The deposition temperature was 200 °C. X-ray photoelectron spectra (XPS) were measured using an AXIS ULTRA Probe instrument from KRATOS Analytical Ltd., Manchester, UK, equipped with a monochromatic Al Kα X-ray source (15 kV, 10 mA) and a magnetic immersion lens. Depth profiles were determined by alternating XPS measurements and stepwise depth sputtering with an Ar+ beam (1 kV, area 2 2 mm2).
Cite This Article
  • APA Style

    Axel Sobottka, Lutz Drößler, C. Hossbach, Bernd Abel, Ulrike Helmstedt. (2014). A Flexible Research Reactor for Atomic Layer Deposition with a Sample-Transport Chamber for in Vacuo Analytics. American Journal of Nano Research and Applications, 2(6-1), 34-38. https://doi.org/10.11648/j.nano.s.2014020601.15

    Copy | Download

    ACS Style

    Axel Sobottka; Lutz Drößler; C. Hossbach; Bernd Abel; Ulrike Helmstedt. A Flexible Research Reactor for Atomic Layer Deposition with a Sample-Transport Chamber for in Vacuo Analytics. Am. J. Nano Res. Appl. 2014, 2(6-1), 34-38. doi: 10.11648/j.nano.s.2014020601.15

    Copy | Download

    AMA Style

    Axel Sobottka, Lutz Drößler, C. Hossbach, Bernd Abel, Ulrike Helmstedt. A Flexible Research Reactor for Atomic Layer Deposition with a Sample-Transport Chamber for in Vacuo Analytics. Am J Nano Res Appl. 2014;2(6-1):34-38. doi: 10.11648/j.nano.s.2014020601.15

    Copy | Download

  • @article{10.11648/j.nano.s.2014020601.15,
      author = {Axel Sobottka and Lutz Drößler and C. Hossbach and Bernd Abel and Ulrike Helmstedt},
      title = {A Flexible Research Reactor for Atomic Layer Deposition with a Sample-Transport Chamber for in Vacuo Analytics},
      journal = {American Journal of Nano Research and Applications},
      volume = {2},
      number = {6-1},
      pages = {34-38},
      doi = {10.11648/j.nano.s.2014020601.15},
      url = {https://doi.org/10.11648/j.nano.s.2014020601.15},
      eprint = {https://article.sciencepublishinggroup.com/pdf/10.11648.j.nano.s.2014020601.15},
      abstract = {A modular reactor for thermal atomic layer deposition (ALD) was designed, which allows changes of all reactor components in order to obtain a flexible set-up for research purpose. A sample transport chamber is included for dual purpose. It allows for in vacuo transport of samples to analytical devices such as an XPS instrument. Surface activation of the samples is possible in the same chamber via an irradiation-induced approach.},
     year = {2014}
    }
    

    Copy | Download

  • TY  - JOUR
    T1  - A Flexible Research Reactor for Atomic Layer Deposition with a Sample-Transport Chamber for in Vacuo Analytics
    AU  - Axel Sobottka
    AU  - Lutz Drößler
    AU  - C. Hossbach
    AU  - Bernd Abel
    AU  - Ulrike Helmstedt
    Y1  - 2014/12/23
    PY  - 2014
    N1  - https://doi.org/10.11648/j.nano.s.2014020601.15
    DO  - 10.11648/j.nano.s.2014020601.15
    T2  - American Journal of Nano Research and Applications
    JF  - American Journal of Nano Research and Applications
    JO  - American Journal of Nano Research and Applications
    SP  - 34
    EP  - 38
    PB  - Science Publishing Group
    SN  - 2575-3738
    UR  - https://doi.org/10.11648/j.nano.s.2014020601.15
    AB  - A modular reactor for thermal atomic layer deposition (ALD) was designed, which allows changes of all reactor components in order to obtain a flexible set-up for research purpose. A sample transport chamber is included for dual purpose. It allows for in vacuo transport of samples to analytical devices such as an XPS instrument. Surface activation of the samples is possible in the same chamber via an irradiation-induced approach.
    VL  - 2
    IS  - 6-1
    ER  - 

    Copy | Download

Author Information
  • Leibniz-Institute of Surface Modification, Permoserstra?e 15, 04318 Leipzig, Germany

  • Technische Universit?t Dresden, Institute of Semiconductors and Microsystems, N?thnitzer Stra?e 64, 01187 Dresden, Germany

  • Leibniz-Institute of Surface Modification, Permoserstra?e 15, 04318 Leipzig, Germany

  • Leibniz-Institute of Surface Modification, Permoserstra?e 15, 04318 Leipzig, Germany

  • Sections