A Flexible Research Reactor for Atomic Layer Deposition with a Sample-Transport Chamber for in Vacuo Analytics
American Journal of Nano Research and Applications
Volume 2, Issue 6-1, December 2014, Pages: 34-38
Received: Nov. 16, 2014;
Accepted: Nov. 19, 2014;
Published: Dec. 23, 2014
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Axel Sobottka , Leibniz-Institute of Surface Modification, Permoserstraße 15, 04318 Leipzig, Germany
Lutz Drößler , Leibniz-Institute of Surface Modification, Permoserstraße 15, 04318 Leipzig, Germany
C. Hossbach , Technische Universität Dresden, Institute of Semiconductors and Microsystems, Nöthnitzer Straße 64, 01187 Dresden, Germany
Bernd Abel , Leibniz-Institute of Surface Modification, Permoserstraße 15, 04318 Leipzig, Germany
Ulrike Helmstedt , Leibniz-Institute of Surface Modification, Permoserstraße 15, 04318 Leipzig, Germany
A modular reactor for thermal atomic layer deposition (ALD) was designed, which allows changes of all reactor components in order to obtain a flexible set-up for research purpose. A sample transport chamber is included for dual purpose. It allows for in vacuo transport of samples to analytical devices such as an XPS instrument. Surface activation of the samples is possible in the same chamber via an irradiation-induced approach.
Axel Sobottka ,
Lutz Drößler ,
C. Hossbach ,
Bernd Abel ,
Ulrike Helmstedt ,
A Flexible Research Reactor for Atomic Layer Deposition with a Sample-Transport Chamber for in Vacuo Analytics, American Journal of Nano Research and Applications. Special Issue: Advanced Functional Materials.
Vol. 2, No. 6-1,
2014, pp. 34-38.
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To verify the reactor Al2O3 films were deposited with the instrument described above. AlMe3 (pur. ≥ 98 %) was used as obtained from Strem Chemicals Inc., Millipore ® grade water was degassed before filling of the precursor containers. Containers were kept at room temperature during deposition. Nitrogen was used as a carrier gas at a flow rate of 600 ml/min. Pulsing times were 1 s for the precursors and 4 s for purge gas. The deposition temperature was 200 °C. X-ray photoelectron spectra (XPS) were measured using an AXIS ULTRA Probe instrument from KRATOS Analytical Ltd., Manchester, UK, equipped with a monochromatic Al Kα X-ray source (15 kV, 10 mA) and a magnetic immersion lens. Depth profiles were determined by alternating XPS measurements and stepwise depth sputtering with an Ar+ beam (1 kV, area 2 2 mm2).