Optimum WEDM Process Parameters of Incoloy®Alloy800 Using Taguchi Method
International Journal of Industrial and Manufacturing Systems Engineering
Volume 1, Issue 3, November 2016, Pages: 64-68
Received: Oct. 15, 2016; Accepted: Dec. 7, 2016; Published: Jan. 4, 2017
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Authors
Makkapati Sahiti, Department of Mechanical Engineering, Koneru Lakshmaiah University, Vaddeswaram, Guntur, India
Madur Raghavendra Reddy, Department of Mechanical Engineering, Koneru Lakshmaiah University, Vaddeswaram, Guntur, India
Budi Joshi, Department of Mechanical Engineering, Koneru Lakshmaiah University, Vaddeswaram, Guntur, India
J. Peter Praveen, Department of Mathematics, Koneru Lakshmaiah University, Vaddeswaram, Guntur, India
Boggarapu Nageswara Rao, Department of Mechanical Engineering, Koneru Lakshmaiah University, Vaddeswaram, Guntur, India
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Abstract
Studies are made on the wire electrical discharge machining (WEDM) process performance parameters such as material removal rate, kerf and surface roughness of Incoloy®Alloy800 following the Taguchi’s design of experiments. ANOVA is performed to trace the statistically significance of input parameter (viz. gap voltage, pulse-on-time, pulse-off-time and wire feed) on the WEDM process parameters. A simple multi-objective optimization approach is suggested for specifying a set of optimum input parameters to achieve maximum material removal rate, and minimum surface finish and kerf width.
Keywords
ANOVA, Incoloy®Alloy800, Kerf, Material Removal Rate, Surface Roughness, WEDM
To cite this article
Makkapati Sahiti, Madur Raghavendra Reddy, Budi Joshi, J. Peter Praveen, Boggarapu Nageswara Rao, Optimum WEDM Process Parameters of Incoloy®Alloy800 Using Taguchi Method, International Journal of Industrial and Manufacturing Systems Engineering. Vol. 1, No. 3, 2016, pp. 64-68. doi: 10.11648/j.ijimse.20160103.14
Copyright
Copyright © 2016 Authors retain the copyright of this article.
This article is an open access article distributed under the Creative Commons Attribution License (http://creativecommons.org/licenses/by/4.0/) which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
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