Effect of an External Applied Potential on the Photocatalytic Properties of Manganese-Doped Titanium Dioxide
American Journal of Physical Chemistry
Volume 3, Issue 4, August 2014, Pages: 41-46
Received: Aug. 14, 2014; Accepted: Aug. 19, 2014; Published: Aug. 30, 2014
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Authors
Gracien Bakambo Ekoko, Department of Chemistry, University of Kinshasa, P. O. Box 190, Kinshasa XI, Democratic Republic of Congo
Joseph Kanza-Kanza Lobo, Department of Chemistry, University of Kinshasa, P. O. Box 190, Kinshasa XI, Democratic Republic of Congo
Omer Muamba Mvele, Department of Chemistry, University of Kinshasa, P. O. Box 190, Kinshasa XI, Democratic Republic of Congo
Jérémie Lunguya Muswema, Department of Chemistry, University of Kinshasa, P. O. Box 190, Kinshasa XI, Democratic Republic of Congo
Jean-Félix Senga Yamambe, Department of Chemistry, University of Kinshasa, P. O. Box 190, Kinshasa XI, Democratic Republic of Congo
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Abstract
The electrochemical anodic oxidation method was used to prepare thin films of titanium dioxide (TiO2) semiconductors (undoped and doped with Mn). These films were used to test the oxidation of methanol (CH3OH), the degree of which was quantified by measuring the current density produced as a function of an applied potential between 0.5 V and 5.0 V. The value of the potential to be applied in order to prevent fast electron-hole recombination was determined. The observed phenomenon is explained by considering the wave nature of the electron.
Keywords
Anodic Oxidation, TiO2, Mn-Doped TiO2, Applied Bias, Tunnelling Process
To cite this article
Gracien Bakambo Ekoko, Joseph Kanza-Kanza Lobo, Omer Muamba Mvele, Jérémie Lunguya Muswema, Jean-Félix Senga Yamambe, Effect of an External Applied Potential on the Photocatalytic Properties of Manganese-Doped Titanium Dioxide, American Journal of Physical Chemistry. Vol. 3, No. 4, 2014, pp. 41-46. doi: 10.11648/j.ajpc.20140304.11
References
[1]
B. Ekoko, S. Jianian, S. XianRong, Thin Solid Films. 515 (2007) 5287-5397.
[2]
D.M. Blake, Bibliography of work on the heterogeneous photocatalytic removal of hazardous compounds from water and air, in : National Technical Information Service, US Department of Commerce, Springfield, USA, Update n° 4. (2001).
[3]
A. Fujishima, K. Honda, Nature. 238 (1972) 37-38.
[4]
R.I. Subramanian, V.M. Kuno, P.V. Kamat, J. Am. Chem. Soc. 128 (2006) 2385-2393.
[5]
J.Y. Shi, W.H. Leng, W.C. Zhu, Chem. Eng. Technol. 29 (2006) 146-154.
[6]
T.A. McMurray, J.A. Byrne, P.S. Dunlop, J. Appl. Electrochem. 25 (2005) 723-731.
[7]
C. Junshui, L. Meichuan, L.Z. Jidong, J. Environ. Manage. (2004) 43-47.
[8]
C. He, Y. Xiong, Z. Xihai, Thin Solid Films. 422 (2002) 235-238.
[9]
A. Taicheng, Z. Xihai, Y. Xiong, Mater. Phys. Mech. 4 (2001) 101-106.
[10]
C.A. Morris, M.L. Anderson, R.M. Stroud, Science. 23 (1999) 622-624.
[11]
A. Burns, W. Li, C. Baker, Res. Soc. Symp: Proc. 703 (2003) V.5.2.1.
[12]
L. Davydov, F.P. Amaat, S.P. George, U.S. Patent, 6 (2003) 585, 863.
[13]
A.M. Baraka, H.A. Hamed, H.H. Shaarawy, J. Anti-Corros. Method. Mater. 49 (2002) 282-286.
[14]
I. Vrublevsky, V. Parkoun, V. Sokol, J. Schreckenbach, J. Appl. Surf. Sci. 236 (2004) 270-277.
[15]
Vrublevsky, I. ; Parkoun, V. ; Schreckenbach, J. ; Max, G. J. Appl. Surf. Sci. 227 (2004) 282-292.
[16]
I. Vrublevsky, V. Parkoun, V. Sokol, J. Schreckenbach, G. Max, J. Appl. Surf. Sci. 222 (2004) 215-225.
[17]
J.R. Birch, T.D. Burleigh, J. Corrosion. 56 (2000) 1233-1241.
[18]
R. Palombari, M. Ranchella, C. Rol, G.V. Sebastiani, J. Sol. Energ. Mat. Cell. 71 (2002) 359-368.
[19]
J.C. Myland, K.B. Oldham, Anal. Chem. 72 (2000) 3210-3217.
[20]
G.A. Ragoisha, A.S. Bondarenko, Electrochemistry : New research potentiodynamic electrochemical impedance spectroscopy, M. Nunez (Ed.), Nova Science Publ., New York. (2005) 51-75.
[21]
T. Ohsaka, F. Izumi, Y. Fujiki, J. Raman Spectrosc. 7 (1978) 321-324.
[22]
U. Balachandran, N.G. Eror, N.G., J. Solid State Chem. 42 (1982) 276-282.
[23]
A. Linsbigler, C. Rusu, Y.T. Yates, J.Am.Chem.Soc. 118 (1996) 5284-5289.
[24]
P.V. Kamat, J. Pure Appl. Chem. 74 (2002) 1693-1706.
[25]
P.V. Kamat, J. Phys. Chem. B. 106 (2002) 7729-7744.
[26]
T. Hirakawa, P.V. Kamat, J. Am. Chem. Soc. 127 (2005) 3928-3934.
[27]
H. Gerischer, A. Heller, J. Phys. Chem. 95 (1991) 5261-5267.
[28]
P.V. Kamat, Pure Appl. Chem. 74 (2002) 1693-1706.
[29]
S.M. Mc Murry, Quantum Mechanics, Addison-Wesley Publishing Company Inc.(1994).
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