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Synthesis and Thermoelectric Study of Sb (III) Doped Bi2(Te1-Xsex)3 Thin Films by Apt

Received: 12 February 2013    Accepted:     Published: 10 January 2013
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Abstract

Thermoelectric study of Sb (III) doped bismuth tellurium selenide ,Bi2-x Sbx(Te1-xSex)3 thin films were done.They are deposited by Arrested Precipitation Technique (APT). These thin films were prepared using a complexing agent triethanolamine (TEA) and a reducing agent sodium sulphite to avoid hydroxide formation of bismuth precursor Bi (NO3)3 and antimony precursor (SbCl3) in aqueous medium to favor the reaction with Te2- and Se2-chalcogen ions. The preparative conditions such as pH, concentration of precursors, temperature, rate of agitation and time were finalized at initial stages of deposition. As deposited films were annealed at constant temperature (373K) in muffle furnace and then characterized for optostructural, morphological, thermoelectric and figure of merit (ZT). The results demonstrate that the Bi2-x Sbx(Te1-xSex)3 thin films prepared by APT shows band gap in the range 1.46eV to 1.89eV. X-Ray Diffraction (XRD) pattern, Scanning Electron Microscopy (SEM) images reveals that Bi2-x Sbx(Te1-xSex)3 mixed metal chalcogenide films are of nanocrystalline nature and have rhombohedral structure and better morphology. EDAX study shows good stoichiometry. Electrical and TEP study shows Sb(III) doping in Bi2(Te1-xSex)3 mixed metal chalcogenide thin films are semiconducting having p-type conduction mechanism. The highest figure of merit obtained was 0.312 and 0.569 for D1 to D5 samples.

Published in International Journal of Materials Science and Applications (Volume 2, Issue 1)
DOI 10.11648/j.ijmsa.20130201.14
Page(s) 30-36
Creative Commons

This is an Open Access article, distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution and reproduction in any medium or format, provided the original work is properly cited.

Copyright

Copyright © The Author(s), 2024. Published by Science Publishing Group

Keywords

APT, Metal chalcogenides, X-ray diffraction, XPS

References
[1] A. Purkayastha, A. Jain, C. Hapenciuc, R. Buckley, B. Singh, C. Karthik, R. Mehta, T. Borca-Tasciuc, G. Ramanath, Chem. Mater., 23, 3029 ( 2011).
[2] S. V. Ovsyannikov, Yu. A. Grigor’eva, G. V. Vorontsov, L. N. Luk’yanova, V. A. Kutasov, V. V. Shchennikov, Phys. Solid State, 54, 261 (2012).
[3] W. Wang, B. Poudel, J. Yang, D. Z. Wang, and Z. F. Ren, J. Am. Chem. Soc., 127, 13792 (2005).
[4] D. D. Frari, S. Dilibereto, N. Stein, C. Boulanger, J. M. Lecuire, 483,44( 2005).
[5] K. Wojciechowski, E. Godlewska, K. Mars, R. Mania, G. Karpinski, P. Ziolkowski, C. Stiewe, E. Muller, Vacuum, 82, 1003 (2008).
[6] L. N. Lukyanova, V. A. Kutasov, P. P. Konstantinov, & V. V. Popov, J. Electronic Mater.,39, 2070 (2010).
[7] V. A. Kutasov and L. N. Luk’yanova, Fiz. Tverd. Tela, Phys., Solid State, 48, 2289 ( 2006).
[8] L. N. Lukyanova, V. A. Kutasov, and P. P. Konstantinov, Fiz. Tverd. Tela, Phys. Solid State, 47, 233(2005).
[9] H. Noro, K. Sato, and H. Kagechika, J. Appl. Phys. 73, 1252 (1993).
[10] C. Navone, M. Soulier, M. Plissonnier and A. L. Seiler, J. Electronic Mater., 39, 1755( 2010).
[11] B. S. Farag, A. M. Abou EL Soud, H. A. Zayed, S. A.Gad, J. Ovonic Research, 6, 267 ( 2010).
[12] S. M. Patil, S. R. Mane, R. M. Mane, S. S. Mali, P. S. Patil, P. N. Bhosale, Canadian J. Chemistry, 89, 1375( 2011).
[13] R.M. Mane, S.R. Mane, R. R. Kharade, P.N. Bhosale, J. Alloys Compds., 491, 321( 2010).
[14] M. M. El-Samanoudy, Thin Solid films 423, 201, (2003).
[15] P. Lostak, C. Drasar, H. Sussmann, P. Reinshaus, R. Novotny and L. Benes, J. Cry. Growth, 179, 144 (1997).
[16] N. S. Patil, A. M. Sargar, S. R. Mane, P. N. Bhosale, Appl. Surface Sci., 254, 5261 (2008).
[17] L. N. Lukyanova, V. A. Kutasov, V. V. Popov, P. P. Konstan-tinov, Semiconductors and dielectrics, 46, 1404 (2004).
[18] C. A. Bridges, J. E. Greedan, Holger Kleinke, Solid State Chem., 177, 4516 ( 2004).
[19] A. Datta, J. Paul, A. Kar, A. Patra, Z. Sun, L. Chen, J. Martin, G. S. Nolas, J. Cryt. Growth Design. 10, 3983 (2010).
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  • APA Style

    S. M. Patil, M. M. Salunkhe, N. B. Pawar, P. N. Bhosale. (2013). Synthesis and Thermoelectric Study of Sb (III) Doped Bi2(Te1-Xsex)3 Thin Films by Apt. International Journal of Materials Science and Applications, 2(1), 30-36. https://doi.org/10.11648/j.ijmsa.20130201.14

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    S. M. Patil; M. M. Salunkhe; N. B. Pawar; P. N. Bhosale. Synthesis and Thermoelectric Study of Sb (III) Doped Bi2(Te1-Xsex)3 Thin Films by Apt. Int. J. Mater. Sci. Appl. 2013, 2(1), 30-36. doi: 10.11648/j.ijmsa.20130201.14

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    AMA Style

    S. M. Patil, M. M. Salunkhe, N. B. Pawar, P. N. Bhosale. Synthesis and Thermoelectric Study of Sb (III) Doped Bi2(Te1-Xsex)3 Thin Films by Apt. Int J Mater Sci Appl. 2013;2(1):30-36. doi: 10.11648/j.ijmsa.20130201.14

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  • @article{10.11648/j.ijmsa.20130201.14,
      author = {S. M. Patil and M. M. Salunkhe and N. B. Pawar and P. N. Bhosale},
      title = {Synthesis and Thermoelectric Study of Sb (III) Doped Bi2(Te1-Xsex)3 Thin Films by Apt},
      journal = {International Journal of Materials Science and Applications},
      volume = {2},
      number = {1},
      pages = {30-36},
      doi = {10.11648/j.ijmsa.20130201.14},
      url = {https://doi.org/10.11648/j.ijmsa.20130201.14},
      eprint = {https://article.sciencepublishinggroup.com/pdf/10.11648.j.ijmsa.20130201.14},
      abstract = {Thermoelectric study of  Sb (III) doped bismuth tellurium selenide ,Bi2-x Sbx(Te1-xSex)3 thin films were done.They are deposited by Arrested Precipitation Technique (APT). These thin films were prepared using a complexing agent triethanolamine (TEA) and a reducing agent sodium sulphite to avoid hydroxide formation of bismuth precursor Bi (NO3)3 and antimony precursor (SbCl3) in aqueous medium to favor the reaction with Te2- and Se2-chalcogen ions. The preparative conditions such as pH, concentration of precursors, temperature, rate of agitation and time were finalized at initial stages of deposition. As deposited films were annealed at constant temperature (373K) in muffle furnace and then characterized for optostructural, morphological, thermoelectric and figure of merit (ZT). The results demonstrate that the Bi2-x Sbx(Te1-xSex)3 thin films prepared by APT shows band gap in the range 1.46eV to 1.89eV. X-Ray Diffraction (XRD) pattern, Scanning Electron Microscopy (SEM) images reveals that Bi2-x Sbx(Te1-xSex)3 mixed metal chalcogenide films are of nanocrystalline nature and have rhombohedral structure and better morphology. EDAX study shows good stoichiometry. Electrical and TEP study shows Sb(III) doping in Bi2(Te1-xSex)3 mixed metal chalcogenide thin films are semiconducting having p-type conduction mechanism. The highest figure of merit obtained was 0.312 and 0.569 for D1 to D5 samples.},
     year = {2013}
    }
    

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  • TY  - JOUR
    T1  - Synthesis and Thermoelectric Study of Sb (III) Doped Bi2(Te1-Xsex)3 Thin Films by Apt
    AU  - S. M. Patil
    AU  - M. M. Salunkhe
    AU  - N. B. Pawar
    AU  - P. N. Bhosale
    Y1  - 2013/01/10
    PY  - 2013
    N1  - https://doi.org/10.11648/j.ijmsa.20130201.14
    DO  - 10.11648/j.ijmsa.20130201.14
    T2  - International Journal of Materials Science and Applications
    JF  - International Journal of Materials Science and Applications
    JO  - International Journal of Materials Science and Applications
    SP  - 30
    EP  - 36
    PB  - Science Publishing Group
    SN  - 2327-2643
    UR  - https://doi.org/10.11648/j.ijmsa.20130201.14
    AB  - Thermoelectric study of  Sb (III) doped bismuth tellurium selenide ,Bi2-x Sbx(Te1-xSex)3 thin films were done.They are deposited by Arrested Precipitation Technique (APT). These thin films were prepared using a complexing agent triethanolamine (TEA) and a reducing agent sodium sulphite to avoid hydroxide formation of bismuth precursor Bi (NO3)3 and antimony precursor (SbCl3) in aqueous medium to favor the reaction with Te2- and Se2-chalcogen ions. The preparative conditions such as pH, concentration of precursors, temperature, rate of agitation and time were finalized at initial stages of deposition. As deposited films were annealed at constant temperature (373K) in muffle furnace and then characterized for optostructural, morphological, thermoelectric and figure of merit (ZT). The results demonstrate that the Bi2-x Sbx(Te1-xSex)3 thin films prepared by APT shows band gap in the range 1.46eV to 1.89eV. X-Ray Diffraction (XRD) pattern, Scanning Electron Microscopy (SEM) images reveals that Bi2-x Sbx(Te1-xSex)3 mixed metal chalcogenide films are of nanocrystalline nature and have rhombohedral structure and better morphology. EDAX study shows good stoichiometry. Electrical and TEP study shows Sb(III) doping in Bi2(Te1-xSex)3 mixed metal chalcogenide thin films are semiconducting having p-type conduction mechanism. The highest figure of merit obtained was 0.312 and 0.569 for D1 to D5 samples.
    VL  - 2
    IS  - 1
    ER  - 

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Author Information
  • Materials Research Laboratory, Department of Chemistry, Shivaji University, Kolhapur-416 004

  • Materials Research Laboratory, Department of Chemistry, Shivaji University, Kolhapur-416 004

  • Materials Research Laboratory, Department of Chemistry, Shivaji University, Kolhapur-416 004

  • Materials Research Laboratory, Department of Chemistry, Shivaji University, Kolhapur-416 004

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